MICRO/NANO FABRICATION
 
 
 
         
 
 
¹øÈ£ »çÁø Àåºñ¸í ºÐ·ù Àåºñº¸±â ¿¹¾à½Åû
31 E-SEM INSPECTION
30 Electroforming Machine DEPOSITION
29 PECVD II DEPOSITION
28 LPCVD3 (LTO) DEPOSITION
27 LPCVD4 (Low Stress Nitride) DEPOSITION
26 RIE II ETCHING
25 񃧯Charge OTHERS
24 FURNACE 2 DEPOSITION
23 LPCVD5(Poly) DEPOSITION
22 Multi Sputter DEPOSITION
21 °ø°£»ç¿ë·á OTHERS
20 E-beam Lithography PHOTO_LITHOGRAPHY
19 wafer Á¦°ø OTHERS
18 Ion Milling ETCHING
17 »ç¹°ÇÔ OTHERS
16 E-Beam Evaporator II DEPOSITION
15 RIE¥² ETCHING
14 Spin Coater3 PHOTO_LITHOGRAPHY
13 ½Ã¾à¾ÈÀüº¸°üÇÔ OTHERS
12 À¯±â½Ã¾àº¸°üÇÔ OTHERS
   
 
    [1][2][3]