MICRO/NANO FABRICATION
LOT (Low Temp Oxide : SiO2) Àåºñ¸¦ ¼ºñ½º ÇÕ´Ï´Ù.
2007-07-20
5,407
LOT LPCVD Àåºñ¸¦ ¼³Ä¡ÇÏ¿© ¼ºñ½ºÇϰí ÀÖÀ¸´Ï ¸¹Àº ÀÌ¿ë¹Ù¶ø´Ï´Ù,
450µµ °øÁ¤À̸ç, 1 BATCH¿¡ 25Àå (4ÀÎÄ¡) °¡´ÉÇÕ´Ï´Ù.
Oxford ICP ¼ö¸®ÁßÀÔ´Ï´Ù.
Low Stress Nitride 5ÀÎÄ¡, 6ÀÎÄ¡ °øÁ¤ °¡´É ÇÕ´Ï´Ù.